@article{oai:toyama.repo.nii.ac.jp:00006563,
 author = {本多, 祐二 and 井上, 光浩 and 阿部, 孝之},
 journal = {富山大学水素同位体科学研究センター研究報告},
 month = {Jun},
 note = {application/pdf, This report describes the outline of the “polygonal barrel-plasma chemical vapor deposition (CVD) method” and its units in detail. This method is embodied as a new particle surface modification system consisting of 5 parts: 1) a gas-supply unit, 2) a vacuum chamber unit (including gas shower and barrel electrodes), 3) a radio frequency (RF) power supply unit (including matching box), 4) a vacuum pumps, and 5) a control unit. In this method, a hexagonal barrel containing particles is rotated or oscillated during plasma CVD, leading to the efficient and uniform surface modification of individual particles with various materials, especially carbon and metal oxides. In addition, the film thicknesses of the deposited materials can be controlled very easily by changing the RF power and treatment time. Thus, the polygonal barrel-plasma CVD method allows controllable surface modification of particles and is useful for research and development of functionalized particles, Article, 富山大学水素同位体科学研究センター研究報告, 33巻, 2014.06.30, pp.21-27},
 pages = {21--27},
 title = {新しく開発した微粒子表面修飾用多角バレルプラズマ化学蒸着法の概要},
 volume = {33},
 year = {2014}
}