@article{oai:toyama.repo.nii.ac.jp:00006506,
 author = {阿部, 孝之 and 赤丸, 悟士 and 東出, 真吾 and 田口, 明},
 journal = {富山大学水素同位体科学研究センター研究報告 = Annual Report of Hydrogen Isotope Research Center, Toyama University},
 month = {},
 note = {application/pdf, We demonstrated a surface modification of aluminum flakes with SiO2 by using the barrel-sputtering system equipped with a SiO2 target. In order to find suitable sputtering conditions using the system, a SiO2 film was prepared on an Al sheet under various desired oxygen fractions, sputtering gas pressures, and substrate temperatures. XRD analysis and weight of prepared SiO2 film was determined that the suitable sputtering condition for the SiO2 film were 0% oxygen fraction, 3 Pa a total pressure, and 300 K substrate temperature. Surface coating of Al flakes by SiO2 was carried out under these conditions. It was found from SEM and EDS measurements that the surface of Al flakes was coated with a thin uniform SiO2 film., Article},
 pages = {51--56},
 title = {酸化物ターゲットを取り付けたバレルスパッタリング装置によるアルミフレーク表面へのSiO2修飾},
 volume = {26},
 year = {2006}
}