@article{oai:toyama.repo.nii.ac.jp:00006463,
 author = {波多野, 雄治 and 渡辺, 国昭 and 高森, 美幸 and 松田, 健二 and 池野, 進},
 journal = {富山大学水素同位体科学研究センター研究報告 = Annual Report of Hydrogen Isotope Research Center, Toyama University},
 month = {},
 note = {application/pdf, Solid state reaction between tungsten and carbon film was examined at 1073K. Carbon film was deposited onto tungsten sheet by vacuum evaporation at room temperature and analyzed by means of X-ray photoelectron spectroscopy. Carbon and tungsten beneath the carbon film were detected, whereas only trace amount of impurities such as oxygen were present. The binding energy of W 4f electrons indicated that tungsten was in a metallic state at the interface. These observations suggested that no impurity layer existed at the interface. Analysis using transmission electron microscopy showed that carbon was in an amorphous state. The specimen was heated at 1073 K in vacuum, and change in crystal structure was analyzed by means of X-ray diffraction. The peak of W2C appeared after an induction period for ca. 1 min, although W2C is not thermodynamically stable at 1073 K. The peak intensity ratio of W2C to metallic tungsten increased in proportion to the square root of time to take the maximum value at 50 min and then decreased with elapse of time. No peak of WC was observed. These results indicate that the nucleation rate of W2C was much faster than that of WC at 1073 K. The decomposition of W2C was ascribed to the reaction between carbon in W2C and H2O in residual gas., Article, 富山大学水素同位体科学研究センター研究報告 = Annual Report of Hydrogen Isotope Research Center, Toyama University 20, 31-41.(2000)},
 pages = {31--41},
 title = {タングステンとアモルファス炭素膜との固相反応},
 volume = {20},
 year = {2000}
}