@article{oai:toyama.repo.nii.ac.jp:00006457,
 author = {藤野, 健太郎 and 芦田, 完 and 渡辺, 国昭 and 岡部, 俊夫},
 journal = {富山大学水素同位体科学研究センター研究報告 = Annual Report of Hydrogen Isotope Research Center, Toyama University},
 month = {},
 note = {application/pdf, Interest has recently been shown in amorphous carbon films from the viewpoint of fuel recycling and inventory in magnetically confined fusion devices. In this study, amorphous carbon films were prepared on silicon substrates by RF discharge of methane and ethylene, and they were characterized by gas analysis and FR-IR and Raman spectroscopies. The results of gas analysis showed that the carbon film prepared by methane (a-C/CH4) contained a larger amount of hydrogen than that by ethylene (a-C/C2H4) ; the hydrogen-to-carbon rations in the films, [H]/[C], were evaluated to be 1.84 and 1.40 for a-C/CH4 and a-C/C2H4, respectively. The FT-IR and Raman spectroscopies showed that the films consisted of a carbon framework comprised of C-C and C=C bonds, but the fraction of C=C contained in the a-C/CH4 film was smaller than that in the a-C/C2H4 film. It was concluded that the difference in the hydrogen contents was mainly due to the difference in the relative contents of these bonds in the films., Article},
 pages = {47--55},
 title = {メタン及びエチレンプラズマによる炭素膜の調整と水素含有量の評価},
 volume = {19},
 year = {1999}
}