@article{oai:toyama.repo.nii.ac.jp:00006413,
 author = {松山, 政夫 and 渡辺, 国昭 and 諸住, 正太郎},
 journal = {富山大学水素同位体機能研究センター研究報告},
 month = {},
 note = {application/pdf, The authoes have reported that the oxidation of tritium is considerably accelerated by irradiation a mixture gas of HT(H2)-O2 with UV-photons, and this UV-stimulated HT oxidation is mainly due to the formation of intermediates such as ozone and activated oxygen species. This suggests that the oxidation will be much more enhanced in the presence of excess ozone in the reaction system. To examine this possibility, effects of the excess ozone on the UV-stimulated HT oxidation was experimentally studied on the one hand, and reaction mechanisms were investigated by developing a computer simulation program applicable to the three-component system of HT(H2)-O2 -O3. The formation rate of HTO was measured for gasmixtures consisting of O2(75.5 torr), O3(0.5-2% of O2), H2(0.1-3% of O2) and HT(H2/HT=12000). The experiments showed considerable enhancement of the HTO production rate in the presence of excess ozone by UV-photons from a low pressure mercury lamp (5W). The time course of the reaction was reproduced quite well by computer simulation, indicating that the assumed reaction mechanism is valid. This is also supported by observations that the computer simulation reproduced the experimentally observed dependence of ozone decomposition rate on ozone and hydrogen pressures under the UV-irradiation. Those results showed that UV-stimulated HT oxidation was celerated by about 14000 times in the presence of excess ozone. It strongly suggests that the UV-stimulated oxidation in the presence of excess ozone will be applicable to tritium handling systems as a non-catalytic tritium removal method., Article},
 pages = {55--65},
 title = {水素吸蔵合金粉末の飛散防止用カプセルの適用性 （Ⅰ）水素の吸収・脱離特性に対するカプセルの影響},
 volume = {14},
 year = {1994}
}