{"created":"2023-07-25T09:06:12.468185+00:00","id":4428,"links":{},"metadata":{"_buckets":{"deposit":"f20213f5-2c1c-457f-a964-1312da86678c"},"_deposit":{"created_by":3,"id":"4428","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"4428"},"status":"published"},"_oai":{"id":"oai:toyama.repo.nii.ac.jp:00004428","sets":["496:556:559:560:602"]},"author_link":["57349","57348","57347","57351","57352","57350","57346","57345"],"item_3_alternative_title_19":{"attribute_name":"その他（別言語等）のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"マグネトロンスパッタ法によるA1N及びZnO膜のC軸配向性の基盤温度とガス圧依存性"}]},"item_3_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1991-03","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"47","bibliographicPageStart":"43","bibliographicVolumeNumber":"42","bibliographic_titles":[{"bibliographic_title":"富山大学工学部紀要"}]}]},"item_3_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"AlN and ZnO films with high c-axis orientation of the crystallites perpendicular to the film plane have been deposited using a DC planar magnetron type of reactive sputtering. For AlN films, the deviation angle in the rocking curve of (002) plane depended mainly on the energy of sputtered particles with high energy at low working gas pressure. On the other hand, for ZnO films, the deviation angle depended strongly on the substrate temperature because the energy of sputtered particles passing through the ambient gas with diffusion at high working gas pressure was rather low. The degree in c-axis orientation of films depended on the total energy corresponding to both the energy of sputtered particles and the temperature of the substrate surface.","subitem_description_type":"Abstract"}]},"item_3_description_40":{"attribute_name":"資源タイプ(DSpace)","attribute_value_mlt":[{"subitem_description":"Article","subitem_description_type":"Other"}]},"item_3_description_6":{"attribute_name":"引用","attribute_value_mlt":[{"subitem_description":"富山大学工学部紀要，42","subitem_description_type":"Other"}]},"item_3_full_name_3":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"57349","nameIdentifierScheme":"WEKO"}],"names":[{"name":"Takahashi, Takakazu"}]},{"nameIdentifiers":[{"nameIdentifier":"57350","nameIdentifierScheme":"WEKO"}],"names":[{"name":"Takeda, Fumio"}]},{"nameIdentifiers":[{"nameIdentifier":"57351","nameIdentifierScheme":"WEKO"}],"names":[{"name":"Ikeda, Nagayasu"}]},{"nameIdentifiers":[{"nameIdentifier":"57352","nameIdentifierScheme":"WEKO"}],"names":[{"name":"Naoe, Masahiko"}]}]},"item_3_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.15099/00004422","subitem_identifier_reg_type":"JaLC"}]},"item_3_publisher_33":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"富山大学工学部"}]},"item_3_source_id_10":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN00175872","subitem_source_identifier_type":"NCID"}]},"item_3_source_id_8":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"03871339","subitem_source_identifier_type":"ISSN"}]},"item_3_subject_22":{"attribute_name":"国立国会図書館分類","attribute_value_mlt":[{"subitem_subject":"ZM2","subitem_subject_scheme":"NDLC"}]},"item_3_version_type_16":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"高橋, 隆一"}],"nameIdentifiers":[{"nameIdentifier":"57345","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"武田, 文雄"}],"nameIdentifiers":[{"nameIdentifier":"57346","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"池田, 長康"}],"nameIdentifiers":[{"nameIdentifier":"57347","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"直江, 正彦"}],"nameIdentifiers":[{"nameIdentifier":"57348","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2016-02-16"}],"displaytype":"detail","filename":"Kokiyo_42_01_Page043to047.pdf","filesize":[{"value":"759.4 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"Kokiyo_42_01_Page043to047.pdf","url":"https://toyama.repo.nii.ac.jp/record/4428/files/Kokiyo_42_01_Page043to047.pdf"},"version_id":"dc53e252-13d0-4162-9e57-f13746c4c47a"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"マグネトロンスパッタ法","subitem_subject_scheme":"Other"},{"subitem_subject":"Magnetron Sputtering","subitem_subject_scheme":"Other"},{"subitem_subject":"A1N及びZnO膜","subitem_subject_scheme":"Other"},{"subitem_subject":"AIN and ZnO Films","subitem_subject_scheme":"Other"},{"subitem_subject":"C軸配向性","subitem_subject_scheme":"Other"},{"subitem_subject":"C-AXIS","subitem_subject_scheme":"Other"},{"subitem_subject":"基盤温度","subitem_subject_scheme":"Other"},{"subitem_subject":"Substrate Temperature","subitem_subject_scheme":"Other"},{"subitem_subject":"ガス圧","subitem_subject_scheme":"Other"},{"subitem_subject":"Gas Pressure","subitem_subject_scheme":"Other"},{"subitem_subject":"Film deposition","subitem_subject_scheme":"Other"},{"subitem_subject":"rapid quenching effect","subitem_subject_scheme":"Other"},{"subitem_subject":"magnetron sputtering","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Dependence of C-AXIS Orientation for AIN and ZnO Films on Substrate Temperature and Gas Pressure in Magnetron Sputtering","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Dependence of C-AXIS Orientation for AIN and ZnO Films on Substrate Temperature and Gas Pressure in Magnetron Sputtering"}]},"item_type_id":"3","owner":"3","path":["602"],"pubdate":{"attribute_name":"公開日","attribute_value":"2012-10-11"},"publish_date":"2012-10-11","publish_status":"0","recid":"4428","relation_version_is_last":true,"title":["Dependence of C-AXIS Orientation for AIN and ZnO Films on Substrate Temperature and Gas Pressure in Magnetron Sputtering"],"weko_creator_id":"3","weko_shared_id":-1},"updated":"2023-07-25T15:08:27.368103+00:00"}