{"created":"2023-07-25T09:05:07.639737+00:00","id":3120,"links":{},"metadata":{"_buckets":{"deposit":"0b6098c3-d33b-4bfe-922c-cc9c860bcb24"},"_deposit":{"created_by":3,"id":"3120","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"3120"},"status":"published"},"_oai":{"id":"oai:toyama.repo.nii.ac.jp:00003120","sets":["496:556:557:558"]},"author_link":["10437","10435","10440","10436","10439","10438"],"item_2_alternative_title_19":{"attribute_name":"その他（別言語等）のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"3D Micro-Fabrication using Combination Technique of Nano-Scale Processing and Chemical Etching : 2nd Report, Possibility of 3D Micro-Fabrication using Focused Ion Beam Process"}]},"item_2_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2004-08","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"696","bibliographicPageEnd":"2547","bibliographicPageStart":"2541","bibliographicVolumeNumber":"70","bibliographic_titles":[{"bibliographic_title":"日本機械学會論文集. C編 = Transactions of the Japan Society of Mechanical Engineers. C"}]}]},"item_2_description_15":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_2_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"This study proposes the 3D micro-fabrication method on single crystal silicon using a focused ion beam (FIB) process with masking effect for chemical etching. It could be seen that the area processed by FIB remains though it was etched by KOH solution. The dependence of the masking effect on experimental conditions and its mechanism were studied by various parameters and structural analysis respectively. Some attempts to fabricate 3D micro-structures were made based on these results. Subsequently, the costs can be decreased to fabricate 3D micro-structure and the process be simplified compared to that using a traditional photoresist-masking method, owing to the simple sequential processes of the chemical etching followed by FIB process","subitem_description_type":"Abstract"}]},"item_2_description_40":{"attribute_name":"資源タイプ(DSpace)","attribute_value_mlt":[{"subitem_description":"Article","subitem_description_type":"Other"}]},"item_2_publisher_33":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"社団法人日本機械学会"}]},"item_2_rights_13":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"rights: 本文データは社団法人日本機械学会の許諾に基づきCiNiiから複製したものである"}]},"item_2_source_id_10":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN00187463","subitem_source_identifier_type":"NCID"}]},"item_2_source_id_8":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"03875024","subitem_source_identifier_type":"ISSN"}]},"item_2_version_type_16":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"川堰, 宣隆"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"柴田, 浩一"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"森田, 昇"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"芦田, 極"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"谷口, 淳"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"宮本, 岩男"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2016-02-16"}],"displaytype":"detail","filename":"機械論文C04-2541.pdf","filesize":[{"value":"999.4 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"機械論文C04-2541.pdf","url":"https://toyama.repo.nii.ac.jp/record/3120/files/機械論文C04-2541.pdf"},"version_id":"28b1cd17-982c-4382-b7e1-bc5644bdb97c"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Focused Ion Beam","subitem_subject_scheme":"Other"},{"subitem_subject":"Single Crystal Silicon","subitem_subject_scheme":"Other"},{"subitem_subject":"Chemical Etching","subitem_subject_scheme":"Other"},{"subitem_subject":"Gallium Ion","subitem_subject_scheme":"Other"},{"subitem_subject":"Dose","subitem_subject_scheme":"Other"},{"subitem_subject":"Dot Pitch","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"ナノスケール機械加工と化学エッチングを併用した3次元極微細構造形成 : 第2報,集束イオンビーム照射を利用した3次元微細構造形成の可能性　(機械要素,潤滑,工作,生産管理など)","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"ナノスケール機械加工と化学エッチングを併用した3次元極微細構造形成 : 第2報,集束イオンビーム照射を利用した3次元微細構造形成の可能性　(機械要素,潤滑,工作,生産管理など)"}]},"item_type_id":"2","owner":"3","path":["558"],"pubdate":{"attribute_name":"公開日","attribute_value":"2007-12-28"},"publish_date":"2007-12-28","publish_status":"0","recid":"3120","relation_version_is_last":true,"title":["ナノスケール機械加工と化学エッチングを併用した3次元極微細構造形成 : 第2報,集束イオンビーム照射を利用した3次元微細構造形成の可能性　(機械要素,潤滑,工作,生産管理など)"],"weko_creator_id":"3","weko_shared_id":3},"updated":"2023-07-25T17:08:49.536755+00:00"}