@article{oai:toyama.repo.nii.ac.jp:00003119,
 author = {川堰, 宣隆 and 森田, 昇 and 山田, 茂 and 高野, 登 and 大山, 達雄 and 芦田, 極},
 issue = {696},
 journal = {日本機械学會論文集. C編 = Transactions of the Japan Society of Mechanical Engineers.C},
 month = {Aug},
 note = {application/pdf, This study proposes a new method on 3D micro fabrication using a combination technique of nano-scale processing and wet chemical etching. The (100) surface of single crystal silicon was processed by using the mechanism of friction force microscope (FFM). A processed area was protuberated in the condition where normal load is less than 372μN. The sample processed in this condition was etched by KOH solution. After the etching process, convex structure was made on processed area. The effect of processing condition on etch rate of processed area was studied. It was found that etch rate was changed with normal load, pitch of processing line and number of processing. Also, mechanism of height change was investigated under those conditions and some 3D microstructure were fabricated by these results., Article},
 pages = {2533--2540},
 title = {ナノスケール機械加工と化学エッチングを併用した3次元極微細構造形成 : 第1報,摩擦力顕微鏡機構を利用した3次元微細構造形成の可能性 (機械要素,潤滑,工作,生産管理など)},
 volume = {70},
 year = {2004}
}